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Due to its extensive use of analog computation and signal processing, the operational amplifier is the most dominant device in the field of electronics. The main aim of this paper is to design and implement a two stage complementary metal oxide-semiconductor operational amplifier using required specifications. It also aims to examine the various results for various parameters and process variations. The simulation is carried out using Tanner tool which uses 45nm technology and the two stage metal oxide semiconductor operational amplifier runs on a supply voltage. Moreover the feasibility of this circuit is heavily dependent on the process variation, which has a significant advantage over analog circuits. As a result, various simulations including AC, DC and Temperature analysis have been carried out for validation, additionally, specified gain of 80dB, Phase margin and power dissipation have also been carried out.
Keywords:
Two-stage Operational amplifier, Analog circuits, Gain, Power dissipation, Temperature analysis, Process variation
Cite Article:
"Design and Implementation of 45nm Operational Amplifier", International Journal of Science & Engineering Development Research (www.ijrti.org), ISSN:2455-2631, Vol.7, Issue 9, page no.452 - 458, September-2022, Available :http://www.ijrti.org/papers/IJRTI2209058.pdf
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000205274
ISSN:
2456-3315 | IMPACT FACTOR: 8.14 Calculated By Google Scholar| ESTD YEAR: 2016
An International Scholarly Open Access Journal, Peer-Reviewed, Refereed Journal Impact Factor 8.14 Calculate by Google Scholar and Semantic Scholar | AI-Powered Research Tool, Multidisciplinary, Monthly, Multilanguage Journal Indexing in All Major Database & Metadata, Citation Generator